Deutsch: Ein hochreiner (99,999 % = 5N) Tantal-Einkristall, hergestellt nach dem Zonenschmelzverfahren, einige einkristalline Tantalbruchstücke sowie für den Größenvergleich ein reiner (99,99 % = 4N) 1 cm3 Tantal-Würfel.
English: A high purity (99.999 %) tantalumsingle crystal, made by the floating zone process, some single crystalline fragments of tantalum, as well as a high purity (99.99 % = 4N) 1 cm3 tantalum cube for comparison.
Français : Un monocristal de tantale de haute pureté (99,999 %), obtenu par la Méthode de la zone fondue. Pour comparaison, on peut aussi voir sur l'image des fragments monocristallins de tantale, ainsi qu'un cm3 du même élément pur à 99,99 % et anodisé.
made by focus stacking software from 18x single shots
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English: A high purity (99.999 %) tantalumsingle crystal, made by the floating zone process, some single crystalline fragments of tantalum, as well as a high purity (99.99 % = 4N) 1 cm3 tantalum cube for comparison.
Citas valodas:
Dansk: En enkeltkrystal af tantal med høj renhed (99,999%), fremstillet ved en zonesmeltningsproces. Desuden nogle krystalfragmenter af Tantal samt en 1 cm3 tantalterning af høj renhed (99,99 % = 4N) til sammenligning.
Deutsch: Ein hochreiner (99,999 % = 5N) Tantal-Einkristall, hergestellt nach dem Zonenschmelzverfahren, einige einkristalline Tantalbruchstücke, sowie für den Größenvergleich ein reiner (99,99 % = 4N) 1 cm3 Tantal-Würfel.
English: A high purity (99.999 %) tantalumsingle crystal, made by the floating zone process, some single crystalline fragments of tantalum, as well as a high purity (99.99 % = 4N) 1 cm3 tantalum cube for comparison.
Español: Un monocristal de tántalo de alta pureza (99,999%), obtenido por el proceso de fusión de zona, algunos fragmentos de monocristal, y un cubo de 1 cm³ de alta pureza (99,99% = 4N) para comparar.
Français : Un monocristal de tantale de haute pureté (99,999 %), obtenu par la Méthode de la zone fondue. Pour comparaison, on peut aussi voir sur l'image des fragments monocristallins de tantale, ainsi qu'un cm3 du même élément pur à 99,99 % et anodisé.
Italiano: Monocristallo di it:Tantalio ad elevata purezza (99,999 %) ottenuto per rifusione a zone; accanto alcuni frammenti dello stesso metallo e un cubetto da 1 cm3 con purezza del 99,99% = 4N.
Magyar: 99,999%-os tisztaságú tantál egykristály.
Nederlands: Hoogzuiver (99,999% = 5N) tantaal-eenkristal, samengesteld door het zonesmeltproces, een aantal eenkristal-tantaalbrokstukken, alsook ter vergelijking een zuivere (99,99% = 4N) tantaalkubus van 1 cm3.
Copyleft: This work of art is free; you can redistribute it and/or modify it according to terms of the Free Art License. You will find a specimen of this license on the Copyleft Attitude site as well as on other sites. http://artlibre.org/licence/lal/enFALFree Art Licensefalsetrue
Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 only as published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License.
== {{int:filedesc}} == {{Information |Description={{de|1=Ein hochreiner (99,999 % = 5N) Tantal-Einkristall, hergestellt nach dem Zonenschmelzverfahren, sowie für den Größenvergleich ein
Šis fails satur papildu informāciju, kuru, visticamāk, ir pievienojis digitālais fotoaparāts vai skeneris, ar ko veidots fails. Ja šis fails pēc tam ir ticis modificēts, šie dati var neatbilst izmaiņām (var būt novecojuši).
Fotoaparāta ražotājs
Canon
Fotoaparāta modelis
Canon EOS 5D Mark II
Autors
Heinrich Pniok
Autortiesību īpašnieks
Copyright: Heinrich Pniok
Ekspozīcijas laiks
1/6 s (0,16666666666667)
Diafragmas atvērums
f/10
ISO jutība
200
Izveidošanas datums un laiks
2010. gada 29. maijs, plkst. 10.17
Fokusa attālums
100 mm
Orientācija
Normāla
Horizontālā izšķirtspēja
300 dpi
Vertikālā izšķirtspēja
300 dpi
Lietotā programma
Adobe Photoshop CS4 Windows
Attēla pēdējās izmainīšanas datums un laiks
2010. gada 29. maijs, plkst. 22.30
Y and C positioning
Centrēts
Ekspozīcijas programma
Diafragmas prioritāte
EXIF versija
2.2
Attēla izveidošanas datums un laiks
2010. gada 29. maijs, plkst. 10.17
APEX slēdža ātrums
2,625
APEX apertūra
6,625
Ekspozīcijas nobīde
0,66666666666667
Mērīšanas režīms
Punkta
Zibspuldze
Zibspuldze netika izmantota, compulsory flash suppression